In the semiconductor manufacturing industry, water purity is critical to production processes and product quality. The EDI (Electrodeionization) ultra-pure water system is an essential piece of equipment in semiconductor production, providing ultra-high purity water for wafer cleaning, chemical dilution, and other critical manufacturing steps.
The EDI ultra-pure water system combines electrodeionization technology with RO (Reverse Osmosis) technology to further remove residual ions in the water through ion exchange membranes and an electric field. This system is typically used as an upgrade to the back-end of an RO pure water system, achieving ultra-pure water standards.
Applications in Semiconductor Manufacturing
- Wafer Cleaning:In semiconductor wafer production, each photolithography and etching process requires thorough cleaning. Ultra-pure water is an irreplaceable medium. The EDI ultra-pure water system ensures that cleaning water is free of impurities or ions, preventing contamination of wafer surfaces and ensuring stable product quality.
- Chemical Dilution:Semiconductor manufacturing involves extensive use of corrosive chemicals such as sulfuric acid and hydrofluoric acid. Using ultra-pure water for dilution ensures precise reactions without introducing other impurities, avoiding chemical interference during production.
- Cooling Water Systems:Large volumes of cooling water are required during semiconductor equipment operations. Water produced by the EDI ultra-pure water system improves cooling efficiency, prevents equipment scaling, and extends equipment lifespan.
Applications Beyond Semiconductors
The EDI ultra-pure water system is not limited to the semiconductor industry; it is also widely used in pharmaceuticals, electronics, photovoltaics, and other high-end manufacturing sectors. With the advancement of environmental regulations in Thailand and industrial upgrades, businesses increasingly prioritize energy-efficient and eco-friendly water treatment equipment.
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